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Opto-Edu A63-7010 EBL Electron Beam Lithography System Officially Launched

March 2, 2026
Opto-Edu A63-7010 EBL Electron Beam Lithography System Officially Launched
— High-Precision Direct-Write Technology Empowers Cutting-Edge Research and Micro/Nano Device Development

Opto-Edu (Beijing) Co., Ltd., a global manufacturer of precision optical tools, today formally unveiled the global launch of its next generation A63-7010 EBL system. The new system features a fine beam spot of ≤2 nm, 50 MHz high-speed scanning, and laser interferometer-based precision positioning to provide a low cost direct-write lithography solution for advanced semiconductor R&D, quantum device manufacturing and nanophotonic. Key benefits of this system are: Precision and efficiency.

The A63-7010 EBL system incorporates an advanced electron optical design with dual-mode imaging capabilities—featuring both side-mounted secondary electron detectors and in-column electron detectors. It exhibits a resolution below 1 nm at 15 kV acceleration voltage and a resolution of ≤1.5 nm at low-voltage 1 kV. At beam current density > 5,300 A/cm, and a minimum beam spot size > 2 nm, it has a high speed electron beam shutter with response time <100 ns (i.e. nanoscale pattern writing speed). Precision step integrates a closed-loop laser interferometer control system with large-area field stitching, thereby eliminating stitching errors typical of traditional EBL systems in large-pattern fabrication. This ensures the nanostructures will not differ in multiple fields. 50 MHz high speed scanning engine, combined with intelligent path optimization algorithms, significantly reduce the exposure time for complex patterns, which is more important for researchers due to their multi-purpose throughput and accuracy requirements.

Why Choose the A63-7010? Product Highlights

Compared to conventional photolithography, electron beam direct-write eliminates the need for photomasks—making it ideal for low-volume, high-mix prototyping and customized production. The A63-7010 delivers industrial-grade EBL performance while being optimized specifically for research environments:

  • User-Friendly Operation: Integrated software interface supports standard GDSII/OASIS format import, with built-in process parameter libraries to lower the learning curve
  • High Reliability: Industrial-grade critical components with 1-year warranty and a global technical support network
  • Future-Ready Expandability: Reserved interfaces for cryogenic stages, in-situ characterization modules, and other advanced experimental setups
  • Exceptional Value: Leveraging Opto-Edu's 25 years of optical engineering expertise, the system offers superior cost-performance ratio compared to premium international brands
About Opto-Edu

Opto-Edu (Beijing) Co., Ltd. is a manufacturer of professional microscopes and precision optical tools.With 25 years of experience, the company provides over 2500 product models, such as biological microscopes, stereo microscopes; digital microscopes or scanning electron microscopes (a.k.a. micro/nano production equipment), etc. and is manufactured in more than 100 countries and regions within education, science, industry inspection, and medical diagnostics.

Experience the New Era of Nanofabrication Today

The A63-7010 EBL system is now available for global order placement. We offer customized demonstrations, process validation, and technical training services for universities, research institutions, and high-tech enterprises.